EMS150T Plus的機殼是整體成型的，結構堅固耐用，配有氣冷的70L/S的渦輪分子泵，自動(dòng)進(jìn)氣控制保證了濺射期間最佳的真空水平，真空腔室直徑為165mm并帶有防爆裝置。EMS150T Plus具有“真空閉鎖”功能，可在設備不工作時(shí)維持腔室的真空度，從而保證高真空的性能。
EMS150T Plus系列全自動(dòng)高真空離子濺射/熱蒸發(fā)一體化鍍膜儀給用戶(hù)以類(lèi)似傻瓜相機的簡(jiǎn)單操作、頂級的鍍膜質(zhì)量和對熟手/新手都很理想的用戶(hù)界面，讓用戶(hù)真正領(lǐng)略至臻完美的鍍膜品質(zhì)！
根據不同的應用方向，EMS150T細分為三個(gè)型號：
l EMS150TS Plus：高分辨率濺射鍍膜儀High Resolution Turbomolecular Pumped Sputter Coater，可濺射易氧化和不易氧化金屬，可選各種濺射靶材，包括場(chǎng)發(fā)射電鏡常用的銥和鉻。
l EMS150TE Plus：高真空鍍碳儀，可制作高穩定的碳膜和表面覆形膜，是TEM應用最理想的選擇。
l EMS150TES Plus：集合了離子濺射和熱蒸鍍兩種真空沉積鍍膜方式，鍍膜頭可在幾秒內快速更換，只能邏輯系統自動(dòng)識別所裝的鍍膜頭類(lèi)型，并顯示相應的操作模式。
注：上述各型號都可配備如下可選的附件：金屬蒸鍍、碳絲蒸鍍、膜厚測量等
觸摸屏控制：
EMS150T Plus操作十分簡(jiǎn)單，直觀(guān)的觸摸屏，即使最不熟練的操作者也可以自由操作，同時(shí)可方便的鍵入和存儲數據。為了方便使用，設備中已經(jīng)預存一些了典型的濺射和蒸發(fā)鍍膜參數資料。
鍍膜插入頭選項：
l 具有一系列可互換、即插即用的鍍膜插入頭
l 濺射插入頭適用于易氧化和不易氧化金屬材料，直徑57mmX0.3mm厚鉻靶為標準靶材，可用另外的濺射插入頭來(lái)快速更換鍍膜材料（僅為TS和TES型號）
l 適用于3.05mm碳棒蒸發(fā)插入頭
l 適用于6.15mm碳棒蒸發(fā)頭，建議使用3.05mm直徑的碳棒，它們更容易控制、更經(jīng)濟
l 碳絲蒸發(fā)插入頭
l 金屬蒸發(fā)和光闌潔凈頭，包括向上蒸發(fā)或向下蒸發(fā)（僅為TE和TES型號）
樣品臺選項：
l EMS150T Plus具有各種易更換的樣品臺，drop-in落入式設計具高度可調（除旋轉行星臺）。
l 標準配置為旋轉臺, 直徑為50mm
l 可預設傾斜角度的旋轉臺（可選）
l 可變角度旋轉行星臺（可選）
l 可用于4〞晶圓的平面旋轉臺（可選）
l 顯微鏡載玻片樣品臺（可選）
其它選項：
l 用于高樣品的加高腔室
l 膜厚監測器（FTM）
l 用于測量低和高真空的全范圍真空計
特點(diǎn)和優(yōu)點(diǎn):
l 金屬濺射或碳蒸發(fā)或兩者兼備：一體化設計，節約空間
l 精細顆粒濺射：高分辨率場(chǎng)發(fā)射掃描電鏡（FE-SEM）制樣的精細鍍膜應用
l 渦輪分子泵高真空系統：允許不氧化貴金屬和易氧化其它金屬靶材的濺射鍍膜，大大拓寬了可濺射靶材范圍，既適合普通SEM、高分辨率FE-SEM鍍膜制樣應用，也為許多薄膜應用等材料科研領(lǐng)域提供理想的鍍膜平臺
l 全自動(dòng)觸摸屏控制：快速數據輸入，簡(jiǎn)單操作
l 可儲存多個(gè)客戶(hù)自定義鍍膜方案：對多用戶(hù)實(shí)驗室十分理想
l 與鍍膜過(guò)程和鍍膜材料相匹配的預編程自動(dòng)真空控制
l 精細的厚度控制：使用膜厚監控選項
l “智能”式系統識別：自動(dòng)感知用戶(hù)所裝的插入式鍍膜頭的類(lèi)型
l 高真空碳蒸鍍：對SEM和TEM鍍碳膜應用非常理想
l 蒸發(fā)電流波形控制
l Drop-in落入式快換樣品臺（標配旋轉臺）
l 真空閉鎖功能：可讓工作腔室處于真空狀態(tài)，改善后續真空效果，或在真空條件下保存樣品
l 鍍制厚膜能力：一次真空條件下的濺射時(shí)間可長(cháng)達60分鐘（材料科研領(lǐng)域的應用）
l 人體工程學(xué)設計的整體成型機殼：易維護和易拆裝
l 帶有本地FTP服務(wù)器連接的以太網(wǎng)端口：簡(jiǎn)單的程序更新
l 設有功率因素補償，有效利用電能，降低運行成本
l 符合當前電器法規（CE認證）
EMS150T Plus儀器參數：
|
儀器尺寸 |
585mm寬*470mm*410mm高(總高650mm) |
|
重量 |
33.4KG |
|
工作腔室 |
150mm（內徑）*127mm（高）硼硅酸鹽玻璃腔室，并帶整體安全防護罩 |
|
觸摸屏用戶(hù)界面 |
帶有觸摸按鈕的全圖像界面，包含多達十個(gè)鍍膜程序，可提醒何時(shí)需要維護 |
|
工作腔室 |
150mm（內徑）*127mm（高）硼硅酸鹽玻璃腔室，并帶整體安全防護罩 |
|
樣品臺 |
轉速為8-20rpm的旋轉臺 |
|
真空系統 |
渦輪子分子泵：帶有內部空氣卻的渦輪分子泵，抽速為70L/s
旋轉機械泵：抽速為50L/m的兩級旋轉機械泵，帶有油污過(guò)濾器 |
|
真空測量 |
皮拉尼真空計作為標配 |
|
極限真空度 |
10-5mbar兩級 |
|
電源需求 |
90-250V~50/60Hz 1400VA（ 包括旋轉機械泵電壓240V） |
|
氣體 |
濺射工作氣體氬氣，99.999%（TS和TES版本）；氮氣，放氣破真空氣體（可選） |
|
金屬蒸發(fā)和光闌清潔頭 |
用于源自鎢絲籃或舟的金屬熱蒸發(fā)?？膳鋫湟粋€(gè)標準鉬舟用于清潔SEM或TEM光闌 |
|
碳蒸發(fā) |
穩定的無(wú)紋波直流電源控制的脈沖蒸發(fā)，確保源自碳棒或碳絲的可重復蒸碳 |
|
電流脈沖 |
1-90安培 |
|
濺射 |
0-150mA?？深A設膜厚（需FTM選項）或使用內置定時(shí)器 |
|
濺射工作真空范圍 |
5*10-3到5*10-1mbar |
|
濺射靶材和碳耗材供應 |
EMS150TS和EMS150TES標配鉻靶，但可選用的其它靶材范圍很寬，包括那些廣泛用于SEM制樣的靶材，如：Au金靶，Au/pd金鈀，Pt鉑靶，和Iridium銥靶。對非SEM應用，可選用的靶材包括：AI鋁，Ta鉭，ITO氧化銦錫，Fe鐵，W鎢，Ti鈦，等等：碳制品包括高純度碳棒和碳絲纖維 |
訂購信息：
|
貨號 |
產(chǎn)品名稱(chēng) |
|
3390 |
EMS150T E Plus Turbomolecular pumped carbon evaporator suitable for TEM and SEM applications. Fitted with a carbon rod evaporation insert for 3.05mm Ø carbon rods. Supplied with carbon rods (3.05mm Ø x 300mm) and a carbon rod shaper (manual operation) |
|
3380 |
EMS150T S Plus- High resolution turbomolecular pumped sputter coater, including a 54mm Ø x 0.3mm chromium target |
|
3400 |
EMS150T ES Plus- High-resolution turbomolecular pumped sputter coater, including a 57mm Ø x 0.3mm chromium target and high vacuum carbon rod evaporation coater for 3.05mm Ø carbon rods. |
|
91003 |
Edwards RV3 50L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter |
可選配件：
|
貨號 |
產(chǎn)品名稱(chēng) |
|
3200 |
Sputtering head insert suitable for oxidizing and non-oxidizing metals. Supplied with a 54mm x 0.3mm thick chromium target as standard. For additional targets see Sputtering Targets section |
|
3210 |
Additional sputter insert for quick metal change. Note: this is an entire sputtering assembly. |
|
3230 |
Carbon rod evaporation head insert (for 3.05mm Ø rods) |
|
3240 |
Carbon rod evaporation head insert (for 6.15mm Ø rods). Note that EMS recommends 3.05mm Ø rods as they offer greater process control and are more economical (less wastage). |
|
3250 |
Carbon fiber evaporation head insert |
|
3260 |
Metal evaporation and aperture cleaning head insert, including the ability to evaporate upwards or downwards (T E and T ES |
|
3270 |
Extended height vacuum chamber (214mm high – the standard chamber is 127mm high). For increased source to sample distance and for coating large specimens |
|
3280 |
Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the EMS150T when bench depth is limited |
|
3290 |
Film thickness monitor (FTM) attachment. Consists of a built in chamber mounted quartz crystal oscillator (includes crystal). As sputtered or evaporated material is deposited onto the crystal, so its frequency of oscillation is modified. This ‘modification’ is used to measure and control the thickness of material deposited |
|
3300 |
Spare quartz crystals. Pack of three |
|
3320 |
Full range vacuum gauge for low and high vacuum measurement (a low vacuum Pirani gauge is fitted as standard) |
|
4513 |
Glow discharge insert to modify surface properties (eg hydrophobic to hydrophilic conversion) or to clean surface residues (TS and T ES only). Can be retrofitted |
|
3600 |
Metal evaporation basket - pack of 10 (for use with metal evaporation head) |
|
3610 |
Two-year spares kit for EMS150T S |
|
3620 |
Two-year spares kit for EMS150T E |
|
3630 |
Two-year spares kit for EMS150T ES |
樣品臺選件;
|
貨號 |
產(chǎn)品名稱(chēng) |
|
3330 |
Rotation stage, 50mm Ø (supplied as standard). This stage only rotates – no tilt or height adjustment |
|
3340 |
Rotate-tilt specimen stage with adjustable tilt (up to 90 degrees) and height (37mm-60mm). Tilt angle can be pre-set. 50mm Ø specimen platform with six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm |
|
3350 |
Variable angle “Rotacota” rotary planetary stage with 50mm Ø specimen platform. Has six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm |
|
3360 |
Flat rotation specimen stage for 100mm / 4” wafers, includes gearbox for increased coverage. Stage rotation speed variable between 8 and 20rpm |
|
3370 |
Rotating specimen stage for glass microscope slides (up to two x 75mm x 25mm slides). Stage rotation speed variable between 8 and 20rpm. Includes gear box to allow optional FTM to be used |
濺射靶材和碳耗材選項：
|
貨號 |
產(chǎn)品名稱(chēng) |
|
3410 |
57mm Ø x 0.1mm Gold |
|
3411 |
57mm Ø x 0.1mm Gold/Palladium (80/20) |
|
3412 |
57mm Ø x 0.1mm Platinum |
|
3413 |
57mm Ø x 0.1mm Nickel |
|
3414 |
57mm Ø x 0.1mm Silver |
|
3415 |
57mm Ø x 0.1mm Palladium |
|
3416 |
57mm Ø x 0.1mm Copper |
|
3417 |
57mm Ø x 0.3mm Chromium |
|
3418 |
57mm Ø x 0.5mm Tungsten |
|
3419 |
57mm Ø x 1.5mm Chromium |
|
3420 |
57mm Ø x 0.2mm Tungsten |
|
3421 |
54mm Ø x 1.5mm Carbon |
|
3422 |
57mm Ø x 0.1mm Aluminium |
|
3423 |
57mm Ø x 0.1mm Platinum/Palladium (80/20) |
|
3424 |
57mm Ø x 1.5mm Titanium |
|
3425 |
57mm Ø x 0.3mm Platinum/Palladium (80/20) |
|
3426 |
57mm Ø x 0.3mm Gold |
|
3427 |
57mm Ø x 0.3mm Gold/Palladium (80/20) |
|
3428 |
57mm Ø x 0.3mm Platinum |
|
3429 |
57mm Ø x 0.5mm Titanium |
|
3430 |
57mm Ø x 0.1mm Iron |
|
3431 |
57mm Ø x 0.3mm Iridium |
|
3432 |
57mm Ø x 0.1mm Cobalt |
|
3433 |
57mm Ø x 0.1mm Tin |
|
3434 |
57mm Ø x 0.1mm Molybdenum |
|
3435 |
57mm Ø x 0.3mm Magnesium |
|
3436 |
57mm Ø x 0.1mm Tantalum |
|
3437 |
57mm Ø x 3mm Indium Tin Oxide (90/10) |
|
3500 |
Carbon rods – 6.15mm Ø x 100mm length (unshaped) pack of 10 |
|
3510 |
Carbon rods – 6.15mm Ø x 50mm length (shaped) pack of 10 |
|
3520 |
Carbon rods - 3.05mm Ø x 50mm length (shaped) pack of 10 |
|
3530 |
Carbon rods 3.05mm Ø x 300mm length (unshaped) pack of 10 |
|
3540 |
Carbon fibre cord - high purity - 1m |
|
3550 |
Carbon fibre cord - high purity - 5m |
|
3560 |
Carbon fibre cord - standard grade - 1m |
|
3570 |
Carbon fibre cord - standard grade - 10m |
|
3580 |
Carbon fibre cord - standard grade - 100m |
|
3590 |
Manual rod shaper for 6.15mm Ø carbon rods |
|
3595 |
Manual rod shaper for 3.05mm Ø carbon rods |
| 電話(huà) 010-52571502 010-51248120 郵箱 hedebio@163.com |
